Course Objectives:
'Learn physics principles of X-ray Photoelectron Spectroscopy (XPS)
'Learn about the analysis of surfaces with XPS and limitations of the technique.
'Learn approaches for qualitative and quantitative analysis of XPS data.
'Learn the types of problems that can be solved with XPS examples
'Advanced data analysis: coverage calculation, thin film thickness calculation, etc.

Course Description:
XPS is widely used to determine the chemical composition of a surface (element concentrations, chemical states, lateral and depth distributions, etc.) Nowadays XPS has become a standard technique for the characterization of solid surface. The course will teach how and what information can be provided by XPS.

Day 1:
Introduction: terminology, surfaces, types of surfaces.
The Principles of XPS: production of photoelectrons, electronic configuration of atoms and molecules, energy, spectra, peak labeling. Auger process, valence spectra, handbooks, books, surface sensitivity, information depth and attention length, spin-orbit splitting, chemical shift, plasmons, multiplet splitting, shake-up, handbooks and helpful references will be recommended.

Instrumentation: X-ray anodes, monochromatic radiation, electron energy analyzers, energy resolution, spectrum acquisition, energy scale calibration, electron detectors, small area analysis, imaging XPS, vacuum system, samples and sample handling.

Day 2:
Artifacts: radioactive and thermal damage, charging, methods for charge control, ghost peaks.

Qualitative Analysis: Identification of elements, changing x-ray sources, charging correction and reference lines, jnterpretation of chemical shift, relaxation effects. Auger parameter, peak widths, line shapes.

Quantitative Analysis and Data Processing: sensitivity factors, ionization cross section, asymmetry parameter, analyzer transmission, intensities, background subtraction, satellite subtraction, detection limit, effect of thin overlayers, peak area, lineshapes, curve fitting, deconvolution.

Depth Profiling: non-destructive and destructive methods, angle resolved XPS, elastic and inelastic scattering, sputtering, sputtering depth calibration.

Applications: some further examples of applications of XPS
Advance Data Processing: coverage calculation, thin film thickness calculation.