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Facilities

Appenzeller NanoLab

The NanoLab adds two components that complement the equipment capabilities available at the Birck Nanotechnology Center Facilities – electron beam lithography and electrical characterization.

 

Raith e_Line Electron Beam Lithography System raith

• Minimum line width < 20nm
Stitching accuracy of 40nm
Overlay accuracy of 40nm
• Sample size capacity up to 4" wafers
• Thermal assisted field emission gun
• 10 MHz DSP-controlled digital pattern generator
• Cross-over free column with highest beam current at 2nm spot size
• Laser interferometer stage with 100mm x 100mm travel range and 2nm    resolution achieved by closed-loop piezo-positioning
• Training manual [pdf]

   
Lake Shore Electromagnet-Based Horizonal Field Cryogenic
Probe Station
emphx

• Model: EMPHX-HF
• 5.5kOe (0.55T) horizontal (in-plane) field electromagnet
• 360° sample stage rotation option
• High stabilility operation from 3.2K to 400K
• Accommodates up to 25mm (1in) diameter wafers
• Four thermally anchored micro-manipulated probe arms
• Probe arms with 3-axis adjustments and ±5° theta planarization
• Cables, shields, and guards minimize electrical noise and thermal losses
• Data Sheet [pdf]

   
Lake Shore 4-Inch Wafer Cryogenic Probe Station fwpx

• Model: FWPX
• High stability operation from 3.5K to 475K
• Accommodates up to 102mm (4in) diameter wafers
• Six thermally anchored micro-manipulated probe arms
• Probe arms with 3-axis adjustments and ±5° theta planarization
• Sample stage with in-plane translation and ±5° in-plane rotation
• High vacuum to 10^-6 torr
• Cables, shields, and guards minimize electrical noise and thermal losses
• Data Sheet [pdf]

   
Lake Shore Superconducting Magnet-Based Vertical Field Cryogenic Probe Station cpxvf

• Model: CPX-VF
• 25kOe (2.5T) vertical field superconducting magnet
• High stability operation from 2K to 400K
• Sample can be maintained at room temp while system cools.
• S
• Accommodates up to 51mm (2in) diameter wafers
• Four thermally anchored micro-manipulated probe arms
• Probe arms with 3-axis adjustments and ±5° theta planarization
• Sample stage with in-plane translation and ±5° in-plane rotation
• High vacuum to 10^-7 torr
• Cables, shields, and guards minimize electrical noise and thermal losses
• Data Sheet [pdf]

   
Agilent 4155C Semiconductor Parameter Analyzer (2) agilent

• Triaxial-guarding
• 4xMedium Power SMUs (MPSMUs) with 10fA/2μV resolution
• 2xVoltage Monitor Units (VMUs) with 0.2μV res. in differential mode
• 2xVoltage Source Units (VSUs)
• Interfaced with Desktops equipped with LabVIEW
• Data Sheet [pdf]
• User's guide [pdf]

   
Andeen-Hagerling (AH 2700A) Ultra-Precision Capacitance Bridge capbridge

• Alto Farad (aF) resolution
• Frequencies from 50Hz - 20kHz
• Interfaced with Desktops equipped with LabVIEW
• Data Sheet [pdf]