Horizontal Furnace

Horizontal furnaces are used for a variety of processes including oxidation, nitride and polysilicon deposition, and annealing. They can also be used to transfer dopants to the surface of wafers and to drive the dopants into the crystal.


RTP stands for Rapid Thermal Processing, that process used to rapidly heat a substrate to a high temperature for a very short time. This process is used to repair damaged crystalline structures and to activate ion implanted dopants.


In addition to the standard fabrication processes, the Birck center has a 248 nm excimer laser used for lift-off processing and laser annealing.