Jipelec

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General Information

iLab Name: Jipelec RTA

iLab Core: BRK Furnace Core

FIC: Shared

Owner: Rich Hosler

Location: Cleanroom R Bay

Max Wafer Size: 8 inch (200 mm)

System Information

General Description

The Jipelec RTA is a very powerful rapid thermal processing machine. The stainless steel cold wall chamber provides a very clean process environment. Small samples are placed on a 6" wafer holder. Temperature control depends upon your final steady state temperature. For temperature below 500°C, a thermocouple is used to control the temperature. For temperatures above 500C, and pyrometer is used.

Capabilities

  • Capable of handling small chip samples as well as whole wafers up to 8 inch
  • Temperature ramping rates can be as high as 300°C per second, although not recommended for process reproducibility
  • Process gases include N2, O2, Ar, and Forming Gas
  • Vacuum annealing capability down to 50 mTorr
  • 1000°C maximum steady state temperature
  • 5 minute maximum steady state time

Materials Compatibility

Compatibility by chamber

Notes

You must supply (and piranha clean) your own 6" silicon wafer as a sample holder for smaller samples

Useful Links

* Must use iLab and be a trained user to reserve a slot on this system.