Nitric Oxide Anneal

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Nitric Oxide Anneal

General Information

iLab Name: Nitric Oxide Anneal

iLab Core: BRK Furnace Core

FIC: Shared

Owner: Rich Hosler

Location: Cleanroom P Bay

Max Wafer Size: 3 inch (75 mm)

System Information

General Description

Small bore, high temperature furnace for annealing silicon carbide.


  • Process gases include Nitric Oxide, and Argon.
  • Able to achieve temperatures of 1150°C

Materials Compatibility

Not Applicable


Due to cleanliness and contamination concerns, this furnace tube is limited use

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* Must use iLab and be a trained user to reserve a slot on this system.