Nanonex NX-2000

Printable version

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Nanonex NX-2000

General Information

iLab Name: Nanonex NX-2000

iLab Core: BRK Lithography Core

FIC: Minghao Qi and Alexandra Boltasseva

Owner: Bill Rowe

Location: Cleanroom N-Bay

Max Wafer Size: 8

System Information

General Description

The Nanonex is a nano-imprint lithography tool for making multiple copies of small geometry patterns.

Capabilities

Molds and substrates from piece size up to 100mm

  • Pressures up to 550psi
  • Temperatures up to 250°C
  • Capable of resolutions <10nm
  • Capable of Thermal Imprinting
  • Capable of UV Imprinting
  • The NX-2000 can do both Thermal imprinting and Photo-curable imprinting
  • Can handle up to an 8 inch wafer
  • Will do patterning of less than 10nm
  • Quick cycle times-usually less than 2 minutes

Materials Compatibility

Not Applicable

Useful Links

* Must use iLab and be a trained user to reserve a slot on this system.