Raith e_LiNE

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Raith e_LiNE

General Information

iLab Name: Raith

iLab Core: BRK Lithography Core

FIC: Joerg Appenzeller

Owner: Bill Rowe

Location: BRK 1239

Max Wafer Size: 4

System Information

General Description

  • The Raith e_LiNE is a 100eV to 30keV system
  • 10MHz pattern processor
  • It is ideal for nanotech research in carbon nanotubes and nanowires
  • Uses a Schottky TFE filament

Capabilities

  • It has a stage travel of 100mm x 100mm.
  • Can handle substrates up to 100mm x 100mm.
  • It can produce geometries less than 20nm in size.
  • Can write with a beam of less than 2nm
  • Can write with a current of 5pA-20nA

Materials Compatibility

Not Applicable

Useful Links

* Must use iLab and be a trained user to reserve a slot on this system.