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General Information

iLab Name: Branson

iLab Core: BRK Etch Core

FIC: Shared

Owner: Francis Manfred

Location: Cleanroom Bay K

Max Wafer Size: 6

System Information

General Description

This plasma system is used to clean substrates, cure PDMS, and strip photoresist or other organics using Ar/O2 plasma.

Materials Compatibility

Not Applicable

Useful Links

* Must use iLab and be a trained user to reserve a slot on this system.