Return to Equipment at Birck Nanotechnology Center


General Information

iLab Name: Branson

iLab Core: BRK Etch Core

FIC: Shared

Owner: Sean Rinehart

Location: Cleanroom Bay K

Max Wafer Size: 6

System Information

General Description

This plasma system is used to clean substrates, cure PDMS, and strip photoresist or other organics using Ar/O2 plasma.

Materials Compatibility

Not Applicable