Birck Nanotechnology Center

PVD E-Beam Evaporator

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PVD E-Beam Evaporator PVD E-Beam Evaporator

General Information

iLab Name: PVD 1

iLab Core: BRK Evaporation/Sputtering Core

FIC: Shared

Owner: Dave Lubelski

Location: Cleanroom-Bay K

System Information

General Description

Six Pocket E-Beam Evaporator used for Ferro-magnetic materials

Capabilities

  • High Purity metal evaporator - Materials are limited to Cu, Ti, Al, Fe, Ni, Co, Sc, Ta
  • Base system pressure 2.0x10-8 torr
  • Accomodates wafers up to 4" diameter
  • Rotatable stage can be Water or LN2 cooled
  • Atmosphere to deposition in 15 minutes
  • Gridless Argon sputtering gun for O2 removal
  • Capable of angled deposition at 30 or 45 degrees

Materials Compatibility

Fe, PY, Ti, Cu, Al, Ni, Co, Sc

Useful Links

* Must use iLab and be a trained user to reserve a slot on this system.