PVD E-Beam Evaporator
General Information
iLab Name: PVD 1
iLab Core: BRK Evaporation/Sputtering Core
FIC: Shared
Owner: Dave Lubelski
Location: Cleanroom-Bay K
System Information
General Description
Capabilities
- High Purity metal evaporator - Materials are limited to Cu, Ti, Al, Fe, Ni, Co, Sc, Ta
- Base system pressure 2.0x10-8 torr
- Accomodates wafers up to 4" diameter
- Rotatable stage can be Water or LN2 cooled
- Atmosphere to deposition in 15 minutes
- Gridless Argon sputtering gun for O2 removal
- Capable of angled deposition at 30 or 45 degrees
Materials Compatibility
Useful Links
* Must use iLab and be a trained user to reserve a slot on this system.
