CHA E-beam Evaporator

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CHA E-beam Evaporator

General Information

iLab Name: CHA

iLab Core: BRK Evaporation/Sputtering Core

FIC: Minghao Qi

Owner: Kenny Schwartz

Location: Cleanroom-Bay K

Max Wafer Size: 4

System Information

General Description

  • Telemark controller
  • Six pocket e-beam evaporator
  • Pockets hold 8.2 cc crucible liners
  • Substrate fixture can hold four 4" wafers with adapters for a 3" wafer, 2" wafer, and fragments of wafers
  • Water cooled, rotatable stage


  • Deposition rates range from 0.2 - 8.0 Angstroms/sec
  • Quick pump down to 5x10-7 torr

Materials Compatibility

Source Materials: Ti, Au, Pt, Pd, Al, Ni, Ge, Cr, Ag

Useful Links

* Must use iLab and be a trained user to reserve a slot on this system.