Parylene CVD

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Parylene CVD

General Information

iLab Name: Parylene CVD Furnace

iLab Core: BRK Growth Core

FIC: Babak Ziaie

Owner: Sean Rinehart

Location: Cleanroom Bay D

Max Wafer Size: 8

System Information

General Description

The Parylene deposition system model 2010 is a vacuum system used for the vapor deposition of the Parylene polymer type C and N onto a variety of substrates. The coating is truly conformal. The system consists of Vaporizer, Pyrolysis main furnace, Deposition chamber, Cold trap, and Vacuum pump.

There are three main steps in the process:

  • Vaporizer: Parylene is vaporized from its solid dimer phase inside the vaporizer.
  • Pyrolysis furnaces: It's a high temperature furnace (> 600C) which converts the dimer to monomer phase.
  • Polymerization: Polymerization happens at room temperature inside the chamber.

In summary, the system converts Parylene dimer to a gaseous monomer. Upon deposition the material polymerizes at room temperature onto the substrate. The coating thickness depends on the amount of dimer loaded in the vaporizer.


Base pressure is less than 10-20 mTorr. Typical Process Settings:

Type C:

  • Vapor Heater Temp.: 175C
  • Pyrolysis Heater Temp.: 690C
  • Chamber Gauge Temp.: 135C
  • Pressure: Base pressure + 15 Vacuum Units (~35 mTorr)
  • Deposition Rate: 5um/hour

Type N:

  • Vapor Heater Temp.: 160C
  • Pyrolysis Heater Temp.: 650C
  • Chamber Gauge Temp.: 135C
  • Pressure: Base pressure + 55 Vacuum Units (~60-75 mTorr)
  • Deposition Rate: 0.75um/hour

Materials Compatibility

Not Applicable

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