ASM F120 ALD

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ASM F120 ALD

General Information

FIC: Peter Ye

Owner: Jerry Shepard

Location: Cleanroom Bay G

Max Wafer Size: 2

System Information

General Description

Atomic Layer Deposition for growing crystals - Al2O3, HfO2, ZrO2, and Ga2O3

Materials Compatibility

Silicon substrates only

Useful Links

* Must use iLab and be a trained user to reserve a slot on this system.