Birck Nanotechnology Center

Raith e_LiNE

General Information

Equipment Name: Raith e_LiNE Airco

Coral Name: Raith

FIC: Joerg Appenzeller

Process/Equipment Owner: Bill Rowe

Location: BRK 1239

Max Wafer Size: 4

 

System Information

General Description:

  • The Raith e_LiNE is a 100eV to 30keV system
  • 10MHz pattern processor
  • It is ideal for nanotech research in carbon nanotubes and nanowires
  • Uses a Schottky TFE filament

 

Capabilities:

  • It has a stage travel of 100mm x 100mm.
  • Can handle substrates up to 100mm x 100mm.
  • It can produce geometries less than 20nm in size.
  • Can write with a beam of less than 2nm
  • Can write with a current of 5pA-20nA

 

Useful System Links

Equipment Use Fees
Reserve System
*
Schedule Training
 


*Must install Coral and be a trained user to reserve a slot on this system.

Facilities