New rates effective June 2009. See specific equipment page for details.
AFM
Anodization
Atomic Layer Deposition
Biology
Conventional Thermal Processing
Dry Etching
E-beam Evaporation
E-beam Lithography
Electrodeposition
FIB
Field Emission Vacuum
FTIR
Hall Effect
Imaging Interferometer
Metalorganic CVD
Molecular Beam Epitaxy
Optical Photolithography
Photomask Generation
Plasma Enhanced CVD
Polishing & Planarization
Probe Stations
Rapid Thermal Processing
SEM
Sputtering Systems
STM
Surface Analysis
Surface Profilometry
TEM
Thermal Evaporation
Vapor Phase Epitaxy
Wafer Bonding
Wafer Cutting & Dicing
Wet Chemical Processing
Wire Bonding
XPS
XRD
Other/Not Listed