Birck Nanotechnology Center

Axic PECVD

General Information

Equipment Name: Axic PECVD

Coral Name: axic

FIC: Shared

Process/Equipment Owner:

Geoff Gardner

Bill Sheldon

Location: Cleanroom Bay R

Max Wafer Size: 8

axic

System Information

General Description: The BenchMark Axic PECVD is a plasma enhanced chemical vapor deposition system used to deposit Silicon oxide and nitride.

Capabilities: The system has following gases:

1- 5% Silane (SiH4)
2- N2O
3- NH3
4- CF4
5- O2
6-N2

It accommodate up to 8" substrate or a variety of smaller substrate sizes.

Maximum RF power: 600W @ 13.56MHz
Maximum electrode temp: 400C
Minimum base pressure: 20 mTorr

Useful System Links

Equipment Use Fees
Reserve System*
Schedule Training
 
*Must install Coral and be a trained user to reserve a slot on this system.

  

Documentation

Operators Manual pdf

Facilities