Equipment Name: Axic PECVD
Coral Name: axic
Location: Cleanroom Bay R
Max Wafer Size: 8
General Description: The BenchMark Axic PECVD is a plasma enhanced chemical vapor deposition system used to deposit Silicon oxide and nitride.
Capabilities: The system has following gases:
1- 5% Silane (SiH4)
It accommodate up to 8" substrate or a variety of smaller substrate sizes.
Maximum RF power: 600W @ 13.56MHz
Maximum electrode temp: 400C
Minimum base pressure: 20 mTorr
Useful System LinksEquipment Use Fees
*Must install Coral and be a trained user to reserve a slot on this system.