Xenon Difluoride Etch
General Information
Equipment Name: Xenon Difluoride Etch
Coral Name: xef2
FIC: Shared
Process/Equipment Owner: John Coy
Location: Cleanroom S Bay
Max Wafer Size: 4
System Information
General Description:
-Xactix Xenon Difluroide e1 etch system for MEMS applications
-Etch rates dependent on amount of exposed silicon
Capabilities:
-Any silicon based sample up to 4 inches.
-Isotropic etch for silicon
Useful System Links
Equipment Use FeesReserve System*
Schedule Training
*Must install Coral and be a trained user to reserve a slot on this system.