Birck Nanotechnology Center

Xenon Difluoride Etch

General Information

Equipment Name: Xenon Difluoride EtchXef2

Coral Name: xef2

FIC: Shared

Process/Equipment Owner: John Coy

Location: Cleanroom S Bay

Max Wafer Size: 4

 

System Information

General Description:

-Xactix Xenon Difluroide e1 etch system for MEMS applications
-Etch rates dependent on amount of exposed silicon

Capabilities:

-Any silicon based sample up to 4 inches.
-Isotropic etch for silicon

Useful System Links

Equipment Use Fees
Reserve System*
Schedule Training
 
*Must install Coral and be a trained user to reserve a slot on this system.

 

Facilities