Panasonic E620 Etcher
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Equipment Name: Panasonic E620 Etcher
Coral Name: panasonic
FIC: Masa Rao
Process/Equipment Owners:
Location: Cleanroom-Bay K
Max Wafer Size: 6
System Information
General Description:
This system use reactive ion etching techniques to anisotropically etch a wide variety of substrates.
System Capabilities:
The Panasonic E620 is a dry etching system which generates up to 1250 watt inductively coupled RF plasma at 13.56 Mhz and up to a 600 watt capacitive bias for highly anisotropic etches. It has the ability use, Ar/CHF3 and CF4/SF6 on shared gas lines, Cl2, N2, O2, and BCl3 as process gasses, allowing for etching of a large variety of materials.
The E620 accepts single flat 6” wafers and uses an electrostatic chuck along with helium backside cooling. Additional features include end point monitoring, error logging and a simple interface with storage for 99 recipes.
Note:
- Gold and platinum are not to be processed in the Panasonic.
- There is a 100g weight limit for the wafer to be loaded into the system.
- Any new materials or use of BCl3 must be approved by BNC Staff
Useful System Links
Equipment Use FeesReserve System*
Schedule Training
*Must install Coral and be a trained user to reserve a slot on this system.