Birck Nanotechnology Center

Oxide PLD system

General Information

Equipment Name: Oxide PLD systemAxitron

Coral Name: pld

FIC: Tim Sands

Process/Equipment Owner: Jeremy Schroeder

Location: BRK 1217

Max Wafer Size: 2

 

System Information

General Description:

  • Versatile pulsed laser deposition system dedicated to oxides
  • Manufacturer: PVD Products, Inc.

System Capabilities:

  • Samples up to 2” diameter wafers
  • Max substrate temperature
    • sapphire = 800°C
    • silicon = 900°C
    • heating via IR lamps
  • Targets
    • three 2”dia. x 0.25”thick target holders
      • smaller target sizes possible
    • current available targets: Ag, Al, Co, Cr, Cu, Fe, Ga, In, Mo, Sc, Ta, Ti, V, W, Zr
  • Gases: O2
  • Laser source
    • Lambda Physik 305i KrF excimer laser (see manual below)
  • Laser rastering
    • uniform rastering across target via rotation and mirror
  • Chamber
    • loadlock
    • base pressure <810-8 Torr

General Comments:

  • No photoresist allowed in system

Useful System Links

Equipment Use Fees
Reserve System*
Schedule Training
 
*Must install Coral and be a trained user to reserve a slot on this system.

  

Documentation

Manual

Standard Operating Procedure

Facilities