Birck Nanotechnology Center

Oxide PLD system

General Information

Equipment Name: Oxide PLD system

Coral Name: pld

FIC: Tim Sands

Process/Equipment Owner: Jeremy Schroeder

Location: BRK 1217

Max Wafer Size: 2

 

System Information

General Description:

• Versatile pulsed laser deposition system dedicated to oxides
  
• Manufacturer: PVD Products, Inc.

System Capabilities:

• Samples up to 2” diameter wafers
  
• Max substrate temperature
  
  • sapphire = 800°C
    
  • silicon = 900°C
    
  • heating via IR lamps
    
• Targets
  
  • three 2”dia. x 0.25”thick target holders
    
    • smaller target sizes possible
      
  • current available targets: Ag, Al, Co, Cr, Cu, Fe, Ga, In, Mo, Sc, Ta, Ti, V, W, Zr
    
• Gases: O2
  
• Laser source
  
  • Lambda Physik 305i KrF excimer laser (see manual below)
    
• Laser rastering
  
  • uniform rastering across target via rotation and mirror
• Chamber
  
  • loadlock
    
  • base pressure <810-8 Torr

General Comments:

• No photoresist allowed in system

Useful System Links

Equipment Use Fees
Reserve System*
Schedule Training
 
*Must install Coral and be a trained user to reserve a slot on this system.

  

Documentation

Manual