Birck Nanotechnology Center

Nitric Oxide Anneal

General Information

Equipment Name: Nitric Oxide AnnealCHA

Coral Name: nitric_oxide_anneal

FIC: Shared

Process/Equipment Owner: Dan Hosler

Location: Cleanroom P Bay

Max Wafer Size: 3

 

System Information

General Description:

A small furnace system for annealing samples in an Nitric Oxide environment.

Capabilities:

Process gases include Nitric Oxide, and Argon.

Useful System Links

Equipment Use Fees
Reserve System*
Schedule Training
 
*Must install Coral and be a trained user to reserve a slot on this system.

  

Documentation

Processing Sequence

Facilities