Birck Nanotechnology Center

Suss MJB-3 Wafer Aligner

General Information

Equipment Name: Suss MJB-3 Wafer Aligner

Coral Name: MJB3-1 and MJB3-2

FIC: David Janes

Process/Equipment Owner: Mike Courtney

Location: Cleanroom N Bay

Max Wafer Size: 3

MJB1
MJB2

System Information

General Description: The Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a cleanroom environment. The MJB3 offers unsurpassed flexibility in the handling of irregularly shaped substrates and pieces of differing thicknesses, as well as standard size wafers up to 3 inches in diameter.

Capabilities: MJB3 Standard or soft contact Line/space resolutions of 1.5 microns and alignment accuracies of 0.2 microns can be obtained under optimum conditions.

MJB3 HP or High Precision Exposures in vacuum contact. Resolutions of 0.8 microns and alignment accuracies of 0.1 micron under optimum conditions

Useful System Links

Equipment Use Fees
Reserve System*
Schedule Training
 
*Must install Coral and be a trained user to reserve a slot on this system.

  

Documentation

Operators Manual pdf

Facilities