Birck Nanotechnology Center

Laser lift-off and laser annealing

General Information

Equipment Name: Laser lift-off and laser annealingAxitron

Coral Name: not listed

FIC: Tim Sands

Process/Equipment Owner: Jeremy Schroeder

Location: BRK 1217

System Information

General Description:

  • homogenized 248nm pulsed excimer laser beam for a broad range of research
  • laser lift-off studies of GaN on sapphire
  • x-y stage for automated rastering of wafers
  • laser annealing vacuum chamber for inert gas ambient
  • laser manufacturer: Lamdba Physik (305i KrF excimer laser)

System Capabilities:

  • homogenized laser beam
    • 1000mJ/cm2 maximum fluence/energy density
    • 10mm x 10mm beam size
    • flat-top profile
    • 1 to 50 Hz
    • 28ns pulse
  • automated x-y stage (Newport)
    • 150mm range
    • 0.5m resolution
  • laser annealing vacuum chamber
    • designed for rough vacuum (<5mTorr)
    • various inert gas ambient possible
    • large 6” quartz viewport
    • holds wafers up to 4” diameter

General Comments:

  • Additional laser training required for access, contact John Coy for details

Useful System Links

Equipment Use Fees
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*Must install Coral and be a trained user to reserve a slot on this system.  

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