FEI Nova 200 NanoLab DualBeamTM-SEM/FIB
General Information
Equipment Name: FEI Nova 200 NanoLab DualBeamTM-SEM/FIB
Coral Name: nova_200
FIC: Eric Stach
Process/Equipment Owner: Dmitri Zakharov
Location: BRK 1237
Max Wafer Size: 6
System Information
General Description:
Combines ultra-high resolution field emission scanning electron microscopy (SEM) and precise focused ion beam (FIB) etch and Pt deposition.
Comprehensive beam chemistries for Pt deposition and etch, and automation enable creation of structures such as:
• Site Specific TEM sample preperation
• Nanotube-based nano-structure assembly;
• Nano-bridge creation;
• Photonic array prototyping;
• Laser prototyping;
• Nano-stamping;
• AFM tip modification;
• MEMS modification,
Equipped with Klocke Nanorobotics Manipulator
System Capabilities:
For information, please see this brochure
Useful System Links
Equipment Use FeesReserve System*
Training Schedule Comments/Suggestions
*Must install Coral and be a trained user to reserve a slot on this system.