Birck Nanotechnology Center

FEI Nova 200 NanoLab DualBeamTM-SEM/FIB

General Information

Equipment Name: FEI Nova 200 NanoLab DualBeamTM-SEM/FIB

Coral Name: nova_200

FIC: Eric Stach

Process/Equipment Owner: Dmitri Zakharov

Location: BRK 1237

Max Wafer Size: 6

2

System Information

General Description:

Combines ultra-high resolution field emission scanning electron microscopy (SEM) and precise focused ion beam (FIB) etch and Pt deposition.

Comprehensive beam chemistries for Pt deposition and etch, and automation enable creation of structures such as:
• Site Specific TEM sample preperation
• Nanotube-based nano-structure assembly;
• Nano-bridge creation;
• Photonic array prototyping;
• Laser prototyping;
• Nano-stamping;
• AFM tip modification;
• MEMS modification,

Equipped with Klocke Nanorobotics Manipulator

System Capabilities:

For information, please see this brochure

Useful System Links

Equipment Use Fees
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*Must install Coral and be a trained user to reserve a slot on this system.

  

Documentation

Users Manual

Facilities