Suss MJB-3 Wafer Aligner

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Suss MJB-3 Wafer Aligner Suss MJB-3 Wafer Aligner

General Information

iLab Name: MJB3_1 and MJB3_2

iLab Core: BRK Lithography Core

FIC: David Janes

Owner: Mike Courtney

Location: Cleanroom N Bay

Max Wafer Size: 3

System Information

General Description

The Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a cleanroom environment. The MJB3 offers unsurpassed flexibility in the handling of irregularly shaped substrates and pieces of differing thicknesses, as well as standard size wafers up to 3 inches in diameter.

Capabilities

MJB3 Standard or soft contact Line/space resolutions of 1.5 microns and alignment accuracies of 0.2 microns can be obtained under optimum conditions. MJB3 HP or High Precision Exposures in vacuum contact. Resolutions of 0.8 microns and alignment accuracies of 0.1 micron under optimum conditions

Materials Compatibility

Not Applicable