Xenon Difluoride Etch

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Xenon Difluoride Etch

General Information

iLab Name: XeF2

iLab Core: BRK Etch Core

FIC: Shared

Owner: Sean Rinehart

Location: Cleanroom S Bay

Max Wafer Size: 4

System Information

General Description

This dry etch system etches silicon for MEMS applications

Capabilities

The Xactix e1 xenon difluoride etch system isotropically etches silicon samples of up to 4” for MEMS and release applications. Etch rates vary depending on amount of exposed silicon.

Materials Compatibility

Not Applicable