Parylene CVD

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Parylene CVD

General Information

iLab Name: Parylene CVD Furnace

iLab Core: BRK Growth Core

FIC: Babak Ziaie

Owner: Sean Rinehart

Location: Cleanroom Bay D

Max Wafer Size: 8

System Information

General Description

The Parylene deposition system model 2010 is a vacuum system used for the vapor deposition of the Parylene polymer type C and N onto a variety of substrates. The coating is truly conformal. The system consists of Vaporizer, Pyrolysis main furnace, Deposition chamber, Cold trap, and Vacuum pump.

There are three main steps in the process:

In summary, the system converts Parylene dimer to a gaseous monomer. Upon deposition the material polymerizes at room temperature onto the substrate. The coating thickness depends on the amount of dimer loaded in the vaporizer.

Capabilities

Base pressure is less than 10-20 mTorr. Typical Process Settings:

Type C:

Type N:

Materials Compatibility

Not Applicable