Cambridge Nanotech Fiji ALD

Return to Equipment at Birck Nanotechnology Center

General Information

iLab Name: Fiji200 ALD

iLab Core: BRK Growth Core

FIC: Zhihong Chen

Owner: Jerry Shepard

Location: Cleanroom Bay G

Max Wafer Size: 8

System Information

General Description

General use ALD for Al2O3, and HfO2, TiO2

Capabilities

Easily configurable for other materials

Materials Compatibility

Clean, vacuum compatible non-outgassing materials. Check with John Coy for compatibality.