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    <title>BNC Equipment Updates</title>
    <link>http://www.purdue.edu/dp/Nanotechnology/facilities/equipment-list.php</link>
    <description>Updates to the Birck Nanotechnology Center&apos;s equipment page will be posted here.</description>
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    <pubDate>Fri, 15 Aug 2008 12:09:49 -0400</pubDate>
    <lastBuildDate>Fri, 15 Aug 2008 12:09:49 -0400</lastBuildDate>
    <item>
      <title>Updates 08.15.08</title>
      <description><![CDATA[<p><b>SEM</b></p>

<p><a href="http://www.purdue.edu/dp/Nanotechnology/facilities/FEINova.php">FEI Nova 200 NanoLab DualBeamTM-SEM/FIB</a></p>

<p><a href="http://www.purdue.edu/dp/Nanotechnology/facilities/SEM.php">Hitachi S-4800 Field Emission SEM</a></p>

<p><hr></p>

<p><b>TEM</b></p>

<p><a href="http://www.purdue.edu/dp/Nanotechnology/facilities/Titan.php">Titan 80-300 kV Environmental Electron Microscope</a></p>]]></description>
      <pubDate>Fri, 15 Aug 2008 12:09:45 -0400</pubDate>
      <guid isPermaLink="false">updates-081508</guid>
    </item>
    <item>
      <title>Updated BNC Equipment List - 5/2008</title>
      <description><![CDATA[<p>Please visit the <a href="http://www.purdue.edu/dp/Nanotechnology/facilities/equipment-list.php">equipment listing</a> online for more detailed information.</p>

<p><b>AFM</b></p><p>    * Veeco Dimension AFM</p><p><b>Anodization</b></p><p>    * Anodization</p><p><b>Atomic Layer Deposition<br />
</b><br />    * Atomic Layer Deposition</p><p><b>Biology</b></p><p><b>Conventional Thermal Processing<br />
</b><br />    * Ammonia Anneal<br />    * Blue M Oven<br />    * Horizontal Furnace<br />    * Nitric Oxide Anneal<br />    * Pyrogenic Oxidation</p><p><b>Dry Etching<br />
</b><br />    * Branson Asher<br />    * Panasonic E620 Etcher<br />    * Plasma Tech RIE<br />    * STS ASE DRIE<br />    * STS AOE DRIE<br />    * Xenon Difluoride Etch</p><p><b>E-beam Evaporation<br />
</b><br />    * Airco E-beam Evaporator<br />    * CHA E-beam Evaporator<br />    * Leybold E-beam Evaporator<br />    * Varian E-beam Evaporator</p><p><b>E-beam Lithography<br />
</b><br />    * Vistec VB6</p><p><b>Electrodeposition<br />
</b><br />    * Electrodeposition (BASi)<br />    * Electrodeposition (Princeton Applied)</p><p><b>FIB<br />
</b><br />
<b>Field Emission Vacuum<br />
</b><br />
<b>FTIR</b></p><p><b>Hall Effect<br />
</b><br />    * Hall Effect MMR</p><p><b>Imaging Interferometer<br />
</b><br />
<b>Metalorganic CVD<br />
</b><br />    * Epigress<br />    * OMVPE - Aixtron</p><p><b>Molecular Beam Epitaxy<br />
</b><br />    * Molecular Beam Epitaxy Growth System</p><p><b>Optical Photolithography<br />
</b><br />    * Canon PLA-501F Wafer Aligner<br />    * Suss MJB-3 Wafer Aligner<br />    * Suss MA 6 Mask Aligner</p><p><b>Photomask Generation<br />
</b><br />    * Electromask System</p><p> <br />	</p><p><b>Plasma Enhanced CVD<br />
</b><br />    * Axic PECVD<br />    * Carbon Nanotube PECVD</p><p><b>Polishing & Planarization<br />
</b><br />
<b>Probe Stations<br />
</b><br />    * Probe Station I<br />    * Probe Station II<br />    * Probe Station III</p><p><b>Rapid Thermal Processing<br />
</b><br />    * Heatpulse 610<br />    * Minipulse RTA</p><p><b>Sputtering Systems<br />
</b><br />    * Anatech Sputterer<br />    * Nitride sputter system<br />    * Perkin Elmer 2400 Sputterer</p><p><b>STM<br />
</b><br />
<b>Surface Analysis<br />
</b><br />    * Filmetrics<br />    * Olympus BX-60<br />    * Stokes Ellipsometer</p><p><b>Surface Profilometry<br />
</b><br />    * Alpha-Step IQ</p><p><b>TEM</b></p><p><b>Thermal Evaporation<br />
</b><br />    * Vecco Thermal Evaporator</p><p><b>Vapor Phase Epitaxy<br />
</b><br />    * HVPE</p><p><b>Wafer Bonding<br />
</b><br />    * Suss SB6e Substrate Bonder</p><p><b>Wafer Cutting & Dicing<br />
</b><br />    * Disco DAD-2H/6 Dicing Saw</p><p><b>Wet Chemical Processing<br />
</b><br />    * Chemical Fume Hoods</p><p><b>Wire Bonding<br />
</b><br />    * Wire bonder</p><p><b>XPS<br />
</b><br />
<b>XRD</b></p><p>    * XRD</p><p><b>Other/Not Listed<br />
</b><br />    * Contact Annealer<br />    * Critical point dryer (CPD)<br />    * Desk-Top Precision Spin Coating System<br />    * DynaPro99 Dynamic Light Scattering<br />    * Hotplate Bonder<br />    * Laser lift-off and laser annealing<br />    * Oxide PLD system<br />    * Parylene CVD<br />    * PL Cryostat<br />    * Ultrapure Water System<br />    * UV flood curing system</p>]]></description>
      <pubDate>Thu, 15 May 2008 11:18:53 -0400</pubDate>
      <guid isPermaLink="false">updated-bnc-equipment-list-52008</guid>
    </item>
    <item>
      <title>Updated BNC Equipment List</title>
      <link>http://www.purdue.edu/dp/Nanotechnology/facilities/equipment-list.php</link>
      <description><![CDATA[<p>Equipment information on the BNC Website:</p>

<p>AFM</p><p>    * Veeco Dimension AFM</p><p>Atomic Layer Deposition</p><p>    * Atomic Layer Deposition</p><p>Biology</p><p>Conventional Thermal Processing</p><p>    * Ammonia Anneal<br />    * Blue M Oven<br />    * Horizontal Furnace<br />    * Nitric Oxide Anneal<br />    * Pyrogenic Oxidation</p><p>Dry Etching</p><p>    * Branson Asher<br />    * Plasma Tech RIE<br />    * STS ASE DRIE<br />    * STS AOE DRIE<br />    * Xenon Difluoride Etch</p><p>E-beam Evaporation</p><p>    * Airco E-beam Evaporator<br />    * CHA E-beam Evaporator<br />    * Leybold E-beam Evaporator<br />    * Varian E-beam Evaporator</p><p>E-beam Lithography</p><p>    * Vistec VB6</p><p>Electrodeposition</p><p>FIB</p><p>Field Emission Vacuum</p><p>FTIR</p><p>Hall Effect</p><p>Imaging Interferometer</p><p>Metalorganic CVD</p><p>    * Aixtron<br />    * Epigress</p><p>Molecular Beam Epitaxy</p><p>    * Molecular Beam Epitaxy Growth System</p><p>Optical Photolithography</p><p>    * Canon PLA-501F Wafer Aligner<br />    * Suss MJB-3 Wafer Aligner<br />    * Suss MA 6 Mask Aligner</p><p>Photomask Generation</p><p>    * Electromask System</p><p> <br />	</p><p>Plasma Enhanced CVD</p><p>    * Axic PECVD<br />    * Carbon Nanotube PECVD</p><p>Polishing & Planarization</p><p>Probe Stations</p><p>    * Probe Station I<br />    * Probe Station II<br />    * Probe Station III</p><p>Rapid Thermal Processing</p><p>    * Heatpulse 610<br />    * Minipulse RTA</p><p>Sputtering Systems</p><p>    * Anatech Sputterer<br />    * Perkin Elmer 2400 Sputterer</p><p>STM</p><p>Surface Analysis</p><p>    * Filmetrics</p><p>Surface Profilometry</p><p>    * Alpha-Step IQ</p><p>TEM</p><p>Thermal Evaporation</p><p>    * Vecco Thermal Evaporator</p><p>Vapor Phase Epitaxy</p><p>Wafer Bonding</p><p>    * Suss SB6e Substrate Bonder</p><p>Wafer Cutting & Dicing</p><p>    * Disco DAD-2H/6 Dicing Saw</p><p>Wet Chemical Processing</p><p>    * Chemical Fume Hoods</p><p>Wire Bonding</p><p>    * Wire bonder</p><p>XPS</p><p>XRD</p><p>    * XRD</p><p>Other/Not Listed</p><p>    * Contact Annealer<br />    * Critical point dryer (CPD)<br />    * Desk-Top Precision Spin Coating System<br />    * Parylene CVD<br />    * Ultrapure Water System</p>]]></description>
      <pubDate>Fri, 15 Feb 2008 14:13:03 -0500</pubDate>
      <guid isPermaLink="false">updated-bnc-equipment-list</guid>
    </item>
    <item>
      <title>Updates - 11.08.2007</title>
      <link>http://www.purdue.edu/dp/Nanotechnology/facilities/equipment-list.php</link>
      <description><![CDATA[<p>New information is available for the following equipment:</p>

<p>Ammonia Anneal
<br />Blue M Oven
<br />Horizontal Furnace
<br />Nitric Oxide Anneal
<br />Pyrogenic Oxidation
<br />Heatpulse 610
<br />Minipulse RTA</p>]]></description>
      <pubDate>Thu, 08 Nov 2007 09:52:57 -0500</pubDate>
      <guid isPermaLink="false">updates-11082007</guid>
    </item>
    <item>
      <title>Updates - 10.17.2007</title>
      <link>http://www.purdue.edu/dp/Nanotechnology/facilities/equipment-list.php</link>
      <description><![CDATA[<p>New information is available for the following equipment:</p>

<p>STS ASE DRIE
<br />Airco E-beam Evaporator
<br />CHA E-beam Evaporator
<br />Leybold E-beam Evaporator
<br />Varian E-beam Evaporator
<br />Canon PLA-501F Wafer Aligner
<br />Suss MJB-3 Wafer Aligner
<br />Anatech Sputterer
<br />Perkin Elmer 2400 Sputterer
<br />Vecco Thermal Evaporator
<br />Critical point dryer (CPD)
<br />Desk-Top Precision Spin Coating System
<br />Contact Annealer</p>]]></description>
      <pubDate>Wed, 17 Oct 2007 16:34:25 -0400</pubDate>
      <guid isPermaLink="false">updates-10172007</guid>
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